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| | 俄罗斯宣布造出130nm光刻机 | | | 钛媒体 ｜ 2026-09-30 | | | |
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scroll 0 1 2026年9月，俄罗斯第一副总理曼图罗夫在微电子论坛上宣布了一件事：俄罗斯和白俄罗斯联合研制的130纳米光刻机样机已经造出来了，国产准分子激光器完成试验，整机验收今年秋天启动，年底结束。
此前俄方已推出350 纳米光刻机设备，短短数月就推出130纳米样机，堪称该国半导体设备领域的一项重大突破，也令中方不由得大吃一惊！
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这台机器可以用来干嘛？
光刻机如果按分辨率分档：最上面是EUV（13.5纳米光源），做7纳米以下最先进逻辑芯片。
中间是DUV（248纳米KrF或193纳米ArF光源），做28纳米到90纳米；再往下是i-line（365纳米汞灯）和深紫外宽幅曝光，做成熟制程和功率器件。
俄罗斯这台130纳米机器，用的是248纳米KrF准分子激光器。它做出来的芯片线宽130纳米，今天看是成熟得不能再成熟的工艺——2002年英特尔奔腾4就是这个制程。
但130纳米在今天不是没用：汽车电子、工业控制、传感器、功率器件、军工芯片，这些领域对制程要求不高，对可靠性和供货稳定性要求极高。
俄罗斯不是要造手机芯片。它是要造导弹里的陀螺仪芯片、苏-57上的航电芯片、S-400里的控制芯片——这些东西130纳米完全够用，而且西方断供之后它自己必须能造。
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